Novel polymers for 193-nm single-layer resist based on cycloolefin polymers

Novel polymers for 193-nm single-layer resist based on cycloolefin polymers

著者名:

Kim,H.-W. ( Samsung Electronics Co.,Ltd. )

掲載資料名:

Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3999

発行年:

2000

巻:

Part2

開始ページ:

1100

終了ページ:

1107

出版情報:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819436177 [0819436178]

言語:

英語

請求記号:

P63600/3999

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018975
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2000 : 17th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2000.02.28-2000.03.01

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1 国際会議録 Novel 193-nm photoresist based on Olefin-containing lactones Yoon,K.-S., Jung,D.-W., Lee,S., Lee,S.-H., Choi,S.-J., Woo,S.-G., Moon,J.-T. SPIE-The International Society for Optical Engineering	7 国際会議録 New approach for 193-nm resist using modified cycloolefin resin Park, J.H., Seo, D.C., Kim, C.-M., Lim, Y.-T., Cho, S.-D., Lee, J.B., Joo,H.-S., Jeon, H.-P., Kim, S.-J., Jung, J.-C., … SPIE-The International Society for Optical Engineering
2 国際会議録 Novel 193-nm single-layer resist containing a multifunctional monomer Lee, G., Koh, C. -W., Jung, J. -C., Jung, M. -H., Kim, H. -S., Baik, K. -H., Choi, I. -H. SPIE - The International Society of Optical Engineering	8 国際会議録 Implementation of the ArF resists based on VEMA for sub-100-nm device Kim, H.-W., Lee, S., Choi, S.-J., Lee, S.-H., Kang, Y., Woo, S.-G., Nam, D.S., Chae, Y.-S., Kim, J.S., Moon, J.-T., … SPIE-The International Society for Optical Engineering
3 国際会議録 Novel single-layer chemically amplified resist for 193-nm lithography Choi,S.-J., Kang,Y., Jung,D.-W., Park,C.-G., Moon,J.-T. SPIE-The International Society for Optical Engineering	9 国際会議録 New polymers for 193-nm single-layer resists based on substituted cycloolefins/maleic anhydride resins Rushkin, I. L., Houlihan, F. M., Kometani, J. M., Hutton, R. S., Timko, A. G., Reichmanis, E., Nalamasu, O., Gabor, A. … SPIE - The International Society of Optical Engineering
4 国際会議録 Novel single-layer photoresist containing cycloolefins for 193 nm Park,J.-H., Seo,D.-C., Kim,K.-D., Park,S.-Y., Kim,S.-J., Lee,H., Jung,J.-C., Bok,C.-K., Baik,K.-H. SPIE-The International Society for Optical Engineering	10 国際会議録 High-performance 193-nm photoresist materials based on ROMA polymers: sub-90-nm contact hole application with resist reflow Joo, H.S., Seo, D.C., Kim, C.M., Lim, Y.T., Cho, S.D., Lee, J.B., Song, J.Y., Kim, K.M., Park, J.H., Jung, J.C., Shin, … SPIE - The International Society of Optical Engineering
5 国際会議録 Improved lithographic performance of 193-nm photoresists based on cycloolefin/maleic anhydride copolymer by employing mixed PAGs Choi,S.-J., Choi,Y.-J., Kim,Y.-S., Kim,S.-D., Kim,D.-B., Kim,J.-H., Koh,C.-W., Lee,G., Jung,J.-C., Baik,K.-H. SPIE-The International Society for Optical Engineering	11 国際会議録 Organosiloxane based bottom antireflective coatings for 193nm lithography Son, E.-K., Kim, J.-W., Lee, S.-H., Park, C.-S., Lee, J.-W., Kim, J., Lee, G.-S., Lee, S.-K., Ban, K.-D., Jung, J.-C., … SPIE - The International Society of Optical Engineering
6 国際会議録 Fluorocarbon-based single-layer resist for 157-nm lithography Song, K.Y., Yoon, K.-S., Choi, S.-J., Woo, S.-G., Han, W.-S., Lee, J.-J., Lee, S.-K., Noh, C.-H., Honda, K. SPIE-The International Society for Optical Engineering	12 国際会議録 Novel high-performance ArF resist for sub-100-nm lithography Lee,G., Koh,C.-W., Jung,J.-C., Jung,M.-H., Kong,K.-K., Kim,J.-S., Shin,K.-S., Choi,S.-J., Kim,Y.-S., Choi,Y.-J., … SPIE-The International Society for Optical Engineering

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