Acidity control for compatibility of novel organic bottom antireflective coating materials with various KrF and ArF photoresists

Acidity control for compatibility of novel organic bottom antireflective coating materials with various KrF and ArF photoresists

著者名:

Hong,S.-E. ( Hyundai Electronics Industries Co.,Ltd. )

掲載資料名:

Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3999

発行年:

2000

巻:

Part2

開始ページ:

966

終了ページ:

973

出版情報:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819436177 [0819436178]

言語:

英語

請求記号:

P63600/3999

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018975
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2000 : 17th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2000.02.28-2000.03.01

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