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New materials for 157-nm photoresists characterization and properties

著者名:
Crawford,M.K. ( DuPont Central Research & Development )
Feiring,A.E.
Feldman,J.
French,R.H.
Periyasamy,M.P.
III,F.L.Schadt
Smalley,R.J.
Zurnsteg,F.C.
Kunz,R.R.
Rao,V.
Liao,L.
Holl,S.M.
さらに 7 件
掲載資料名:
Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3999
発行年:
2000
巻:
Part1
開始ページ:
357
終了ページ:
364
出版情報:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436177 [0819436178]
言語:
英語
請求記号:
P63600/3999
資料種別:
国際会議録

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