Novel resst material for sub-100-nm contact hole pattern

Novel resst material for sub-100-nm contact hole pattern

著者名:

Chung,J.-H. ( Samsung Electronics Co.,Ltd. )
Choi,S.-J.
Kang,Y.
Woo,S.-G.
Moon,J.-T.

掲載資料名:

Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3999

発行年:

2000

巻:

Part1

開始ページ:

305

終了ページ:

312

出版情報:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819436177 [0819436178]

言語:

英語

請求記号:

P63600/3999

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018975
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2000 : 17th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2000.02.28-2000.03.01

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2 国際会議録 Strategy for sub-80-nm contact hole patterning considering device fabrication Yoon, J.-Y., Hata, M., Hah, J.-H., Kim, H.-W., Woo, S.-G., Cho, H.-K., Han, W.-S. SPIE - The International Society of Optical Engineering	8 国際会議録 Improvement of pattern collapse in sub-100 nm nodes Jung, M.-H., Lee, S.-H., Kim, H.-W., Woo, S.-G., Cho, H.-K., Han, W.-S. SPIE-The International Society for Optical Engineering
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4 国際会議録 Experimental methodology of contact edge roughness on sub-100-nm pattern Lee, T.Y., Ihm, D., Kang, H.C., Lee, J.B., Lee, B.-H., Chin, S.-B., Cho, D.-H., Kim, Y.H., Yang, H.D., Yang, K.M. SPIE - The International Society of Optical Engineering	10 国際会議録 Novel polymers for 193-nm single-layer resist based on cycloolefin polymers Kim,H.-W., Lee,S.-H., Kwon,K.-Y., Jung,D.-W., Lee,S., Yoon,K.-S., Choi,S.-J., Woo,S.-G., Moon,J.-T. SPIE - The International Society for Optical Engineering
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