0.12-ヲフm logic process using a 248-nm step-and-scan system
- 著者名:
Baker,D.C. ( Philips Semiconductor ) Zheng,T. Takemoto,C.H. Sethi,S.S. Gabriel,C. Scott,G.S. - 掲載資料名:
- Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3999
- 発行年:
- 2000
- 巻:
- Part1
- 開始ページ:
- 294
- 終了ページ:
- 304
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436177 [0819436178]
- 言語:
- 英語
- 請求記号:
- P63600/3999
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
0.13-ヲフm optical lithography for random logic devices using 248-nm attenuated phase-shifting masks
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
9
国際会議録
Process control and optimization of conventional metal process for 0.18-ヲフm logic technology
SPIE - The International Society for Optical Engineering |
MRS - Materials Research Society |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
12
国際会議録
0.18-ヲフm lithography strategies:248-nm DUV step-and-scanner and advanced chemical amplified resist
SPIE - The International Society for Optical Engineering |