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0.12-ヲフm logic process using a 248-nm step-and-scan system

著者名:
Baker,D.C. ( Philips Semiconductor )
Zheng,T.
Takemoto,C.H.
Sethi,S.S.
Gabriel,C.
Scott,G.S.
さらに 1 件
掲載資料名:
Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3999
発行年:
2000
巻:
Part1
開始ページ:
294
終了ページ:
304
出版情報:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436177 [0819436178]
言語:
英語
請求記号:
P63600/3999
資料種別:
国際会議録

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