Comparison of methods for acid quantification:impact of resist components on acid-generating efficiency
- 著者名:
- Cameron,J.F. ( Shipley Co.,Inc. )
- Fradkin,L.
- Moore,K.
- Pohlers,G.
- 掲載資料名:
- Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3999
- 発行年:
- 2000
- 巻:
- Part1
- 開始ページ:
- 190
- 終了ページ:
- 203
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436177 [0819436178]
- 言語:
- 英語
- 請求記号:
- P63600/3999
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
4
国際会議録
Why do weak acids not work in 193-nm photoresists?: matrix effects on acid-catalyzed deprotection
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Materials Research Society |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |