Modeling chemically amplified resists for 193-nm lithography
- 著者名:
Croffie,E.H. ( Univ.of California/Berkeley ) Cheng,M. Neureuther,A.R. Houlihan,F.M. Cirelli,R.A. Sweeney,J.R. Dabbagh,G. Watson,G.P. Nalamasu,O. Rushkin,I.L. Dimov,O. Gabor,A.H. - 掲載資料名:
- Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3999
- 発行年:
- 2000
- 巻:
- Part1
- 開始ページ:
- 171
- 終了ページ:
- 180
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436177 [0819436178]
- 言語:
- 英語
- 請求記号:
- P63600/3999
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
国際会議録
Recent advances in 193-nm single-layer photoresists based on alternating copolymers of cycloolefins
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |