Design and synthesis of new photoresist materials for ArF lithography

Design and synthesis of new photoresist materials for ArF lithography

著者名:

Choi,S.-J. ( Samsung Electronics Co.,Ltd. )
Kim,H.-W.
Woo,S.-G.
Moon,J.-T.

掲載資料名:

Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3999

発行年:

2000

巻:

Part1

開始ページ:

54

終了ページ:

61

出版情報:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819436177 [0819436178]

言語:

英語

請求記号:

P63600/3999

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018975
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2000 : 17th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2000.02.28-2000.03.01

類似資料:

1 国際会議録 Design and performance of photoresist materials for ArF lithography Kim,H.-W., Jung,D.-W., Lee,S., Choi,S.-J., Woo,S.-G., Kavanagh,R.J., Barclay,G.G., Blacksmith,R.F., Kang,D., Pohlers,G., … SPIE-The International Society for Optical Engineering	7 国際会議録 Investigation of the effect of resist components and process condition on photochemical efficiency of ArF photoresist Kim, J.-W., Son, E.-K., Lee, S.-H., Kim, D., Kim, J., Lee, G., Jung, J.C., Bok, C.K., Moon, S.C., Shin, K.S. SPIE - The International Society of Optical Engineering
2 国際会議録 Nonshrinkable photoresists for ArF lithography Kim, J.-B., Oh, T.H., Choi, J.-H., Lee, J.-J. SPIE-The International Society for Optical Engineering	8 国際会議録 Adaptability and validity of thin organic bottom anti-reflective coating (BARC) to sub-90-nm patterning in ArF lithography Kim, S.-H., Lee, S.-H., Yeo, G.-S., Lee, J.H., Cho, H.-K., Han, W.-S., Moon, J.-T. SPIE-The International Society for Optical Engineering
3 国際会議録 Understanding the photoresist surface-liquid interface for ArF immersion lithography Lim, Y. H., Kim, Y. K., Choi, J. S., Lee, J. G. SPIE - The International Society of Optical Engineering	9 国際会議録 Distributed processing (DP) based e-beam lithography simulation with long range correction algorithm in e-beam machine W. -T. Ki, J. -H. Choi, B. -G. Kim, S. -G. Woo, H. -K. Cho Society of Photo-optical Instrumentation Engineers
4 国際会議録 Implementation of the ArF resists based on VEMA for sub-100-nm device Kim, H.-W., Lee, S., Choi, S.-J., Lee, S.-H., Kang, Y., Woo, S.-G., Nam, D.S., Chae, Y.-S., Kim, J.S., Moon, J.-T., … SPIE-The International Society for Optical Engineering	10 国際会議録 Novel high-performance ArF resist for sub-100-nm lithography Lee,G., Koh,C.-W., Jung,J.-C., Jung,M.-H., Kong,K.-K., Kim,J.-S., Shin,K.-S., Choi,S.-J., Kim,Y.-S., Choi,Y.-J., … SPIE-The International Society for Optical Engineering
5 国際会議録 Novel 193-nm photoresist based on Olefin-containing lactones Yoon,K.-S., Jung,D.-W., Lee,S., Lee,S.-H., Choi,S.-J., Woo,S.-G., Moon,J.-T. SPIE-The International Society for Optical Engineering	11 国際会議録 The feasibility study of KrFHT-PSM in ArF lithography process [6154-165] Lim, Y. H., Kim, H. I., Choi, J. S., Lee, J. G. SPIE - The International Society of Optical Engineering
6 国際会議録 Design and properties of new deep-UV positive photoresist Choi,S.-J., Jung,S.-Y., Kim,C.-H., Park,C.-G., Han,W.-S., Koh,Y.-B., Lee,M.-Y. SPIE-The International Society for Optical Engineering	12 国際会議録 First microprocessors with immersion lithography Lee, D.-Y., Kim, I.-S., Jung, S.-G., Jung, M.-H., Park, J.-O., Oh, S.-H., Woo, S.-G., Cho, H.-K., Moon, J.-T. SPIE - The International Society of Optical Engineering

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