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193-nm photoresists at 130-nm node:which lithographic performances for which chemical platform?

著者名:
Amblard,G.R. ( International SEMATECH )
Byers,J.D.
Domke,W.D.
Rich,G.K.
Graffenberg,V.L.
Patel,S.
Miller,D.A.
Perez,G.B.
さらに 3 件
掲載資料名:
Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3999
発行年:
2000
巻:
Part1
開始ページ:
32
終了ページ:
53
出版情報:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436177 [0819436178]
言語:
英語
請求記号:
P63600/3999
資料種別:
国際会議録

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