A new purged UV spectroscopic ellipsometer to characterize 157 nm nanolithographic materials

A new purged UV spectroscopic ellipsometer to characterize 157 nm nanolithographic materials

著者名:

掲載資料名:

Materials issues and modeling for device nanofabrication : symposia held November 29-December 2, 1999, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

584

発行年:

2000

開始ページ:

177

出版情報:

Warrendale, Pa.: MRS-Materials Research Society

ISSN:

02729172

ISBN:

9781558994928 [1558994920]

言語:

英語

請求記号:

M23500/584

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018971
シリーズID:	PA00000011
会議名:	Materials Issues and Modeling for Device Nanofabrication : Symposium
回次:	1999
会議開催地:	Boston, MA, USA
会議開催年:	1999.11.30-1999.12.02

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1 国際会議録 New purged UV spectroscopic ellipsometer to characterize thin films and multilayers at 157 nm Boher,P., Evrard,P., Piel,J.-P., Stehle,J.-L.P. SPIE-The International Society for Optical Engineering	7 国際会議録 Combined metrology in cluding VUV spectroscopic ellipsometry and grazing x-ray reflectance for precise characterization of thin films and multilayers at 157 nm Boher,P., Evrard,P., Piel,J.-P., Janicot,S., Stehle,J.-L. SPIE-The International Society for Optical Engineering
2 国際会議録 New purged UV spectroscopic ellipsometer to characterize thin films and multilayers at 157 nm Boher,P., Piel,J.P., Evrard,P., Defranoux,C., Espinosa,M., Stehle,J.L.P. SPIE - The International Society for Optical Engineering	8 国際会議録 High-accuracy characterization of antireflective coatings and photoresists by spectroscopic ellipsometry: a new tool for 300-mm wafer technology Pierre Boher, Christophe Defranoux, Sophie Bourtault, Jean-Louis P. Stehle SPIE - The International Society of Optical Engineering
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6 国際会議録 Combined metrology including VUV spectroscopic ellipsometer and grazing x-ray reflectance for precise characterization of thin films and multilayers at 157 nm Boher,P., Evrard,P., Piel,J.P., Stehle,J.L. SPIE-The International Society for Optical Engineering	12 国際会議録 Feasibility and applicability of integrated metrology using spectroscopic ellipsometry in a cluster tool Boher,P., Pickering,C., Tarnowka,A., Piel,J.-P., Evrard,P., Stehle,J.-L.P. SPIE-The International Society for Optical Engineering

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