Application of Supercomputers To Model Fluid Transport and Chemical Kinetics in Chemical Vapor Deposition Reactors

Application of Supercomputers To Model Fluid Transport and Chemical Kinetics in Chemical Vapor Deposition Reactors

著者名:

掲載資料名:

Supercomputer research in chemistry and chemical engineering

シリーズ名:

ACS symposium series

シリーズ巻号:

353

発行年:

1987

開始ページ:

334

出版情報:

Washington, DC: American Chemical Society

ISSN:

00976156

ISBN:

9780841214309 [0841214301]

言語:

英語

請求記号:

A05800/353

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018940
シリーズID:	PA00000004
会議名:	Industrial and Engineering Chemistry Winter Symposium
回次:	1987
会議開催地:	Minneapolis, MN, USA
会議開催年:	1987.03.16-1987.03.17

類似資料:

1 国際会議録 *LASER PROBES AND NUMERICAL MODELING AS PROCESS DIAGNOSTICS IN CHEMICAL VAPOR DEPOSITION Breiland, William G., Ho, Pauline, Coltrin, Michael E,, Kee, Robert J., Evans, Greg H. Materials Research Society	7 国際会議録 Balancing Reactor Fluid Dynamics and Deposition Kinetics to Achieve Compositional Variation in Combinatorial Chemical Vapor Depositions of ZrO, HfO2, and SnO2 Gladfelter, W., Xia, B., Chen, F., Campbell, S., Roberts, J. Electrochemical Society
2 国際会議録 THEORETICAL ANALYSIS OF A ROTATING-DISK CHEMICAL VAPOR DEPOSITION REACTOR Coltrin, Michael E., Breiland, William G., Evans, Gregory H., Kee, Robert J. American Institute of Chemical Engineers	8 国際会議録 Numerical Modelling of Diamond Chemical Vapor Deposition (Invited) Coltrin, M.E., Dandy, D.S. American Institute of Chemical Engineers
3 国際会議録 Chemical Kinetics Models for Semiconductor Processing Coltrin, Michael E., Meeks, Ellen, Grcar, Joseph F., Houf, William G., Kee, Robert J., Creighton, J. Randall MRS - Materials Research Society	9 国際会議録 GAS-PHASE SILICON ATOM DENSITIES IN THE CHEMICAL VAPOR DEPOSITION OF SILICON FROM SILANE Coltrin, Michael E., Breiland, William G., Ho, Pauline MRS - Materials Research Society
4 国際会議録 A METHEMATICAL MODEL OF THE GAS-PHASE AND SURFACE CHEMISTRY IN GaAs MOCVD Coltrin, Michael E., Kee, Robert J. Materials Research Society	10 国際会議録 Modeling approaches for Rapid Thermal Chemical Vapor Deposition: combining transport phenomena with chemical kinetics Jensen F. K., Simka H., Mihopoulos G. T., Futerko P., Hierlemann M. Kluwer Academic Publishers
5 国際会議録 MODELS OF TRANSPORT, GAS-PHASE, AND SURFACE CHEMISTRY IN DIAMOND CHEMICAL VAPOR DEPOSITION Dandy, D.S., Coltrin, M.E. Electrochemical Society	11 国際会議録 Modeling of Transport Phenomena and Detailed Chemistry in Chemical Vapor Deposition Equipment Kuijlaars, K.J., Kleijn, C.R., van den Akker, H.E.A. Electrochemical Society
6 国際会議録 THEORETICAL MODELING AND LASER DIAGNOSTICS OF SILICON CHEMICAL VAPOR DEPOSITION Coltrin, Michael. E., Breiland, William. G., Ho, Pauline American Institute of Chemical Engineers	12 国際会議録 Multi-Dimensional Modeling of Thermal Batteries Using the Stefan-Maxwell Formulation and the Finite- Element Method Chen, Ken S., Evans, Greg H., Larson, Rich S., Coltrin, Mike E., Newman, John Electrochemical Society

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