The Influence of Capping Layer Type on Cobalt Salicide Formation in Films and Narrow Lines

The Influence of Capping Layer Type on Cobalt Salicide Formation in Films and Narrow Lines

著者名:

Besser, P. R.

掲載資料名:

Advanced interconnects and contact materials and processes for future integrated circuits : symposium held April 13-16, 1998, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

514

発行年:

1998

開始ページ:

375

出版情報:

Warrendale, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558994201 [1558994203]

言語:

英語

請求記号:

M23500/514

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018917
シリーズID:	PA00000011
会議名:	Symposium on advanced interconnects and contact materials and processes for future integrated circuits
回次:	1998
会議開催地:	San Francisco, CA, USA
会議開催年:	1998.04.13-1998.04.16

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