Effect of Oxygen on the Degradation of Ti-Si-N Diffusion Barriers in Cu Metallization

Effect of Oxygen on the Degradation of Ti-Si-N Diffusion Barriers in Cu Metallization

著者名:

McArthur, W. F.

掲載資料名:

Advanced interconnects and contact materials and processes for future integrated circuits : symposium held April 13-16, 1998, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

514

発行年:

1998

開始ページ:

321

出版情報:

Warrendale, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558994201 [1558994203]

言語:

英語

請求記号:

M23500/514

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018917
シリーズID:	PA00000011
会議名:	Symposium on advanced interconnects and contact materials and processes for future integrated circuits
回次:	1998
会議開催地:	San Francisco, CA, USA
会議開催年:	1998.04.13-1998.04.16

類似資料:

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2 国際会議録 Compositional Effects on the Degradation of PVD-TiSiN McArthur, W. F., Deng, F., Ring, K., Pattison, P. M., Kavanagh, K. L. MRS - Materials Research Society	8 国際会議録 The Texture Effect on Diffusion Barrier Property on TiN Films between Copper and Si Wafer Sung, D. Y., Kim, I., Lee, M. G., Park, N. J., Yang, B., Yang, J. M., Ko, J. K. Trans Tech Publications
3 国際会議録 Compositional Effects on the Degradation of PVD-TiSiN McArthur, W. F., Deng, F., Ring, K., Pattison, P. M., Kavanagh, K. L. MRS - Materials Research Society	9 国際会議録 Resistance degradation in early stage of electromigration of AI(Cu) metal lines Guo,Q., Lo,K.F., Manna,I., Zeng,X., Jie,B.B. SPIE-The International Society for Optical Engineering
4 国際会議録 In-Situ Oxygen Plasma Enhancement for Coherent Ti/TiN Barrier Metal Application Lee, K.-B., Kwak, N.-J., Kim, S.-D., Kim, C.-T., Fu, J., Nahm, M.K., Diaz, R., Lai, C.S., Xu, Z., Han, B.B., Park, … Electrochemical Society	10 国際会議録 Process integration of TDEAT-based MOCVD TiN as diffusion barrier for advanced Metallization Gn,F.H., Li,Q., Chan,L., Chooi,S.Y.M. SPIE-The International Society for Optical Engineering
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6 国際会議録 THE EFFECT OF STARTING SILICON CRYSTAL STRUCTURE ON PHOTOLUMINESCENCE INTENSITY OF POROUS SILICON Dubbelday, W. B., Russell, S. D., Kavanagh, K. L. MRS - Materials Research Society	12 国際会議録 The Effect of Oxygen on the Electrical Activation and Diffusion of Ion-Implanted Boron Larsen, K. Kyllesbech, Stolk, P. A., Privitera, V., Berkum, J. G. M. van, Boer, W. B. de, Mannino, G., Cowern, N. E. B., … MRS - Materials Research Society

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