Effect of Ion Energy on Structural and Chemical Properties of Tin Oxide Film in Reactive Ion-Assisted Deposition (R-IAD)

Effect of Ion Energy on Structural and Chemical Properties of Tin Oxide Film in Reactive Ion-Assisted Deposition (R-IAD)

著者名:

Cho, Jun-Sik

掲載資料名:

Atomistic mechanisms in beam synthesis and irradiation of materials : symposium held December 1-2, 1997, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

504

発行年:

1999

開始ページ:

313

出版情報:

Warrendale, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558994096 [1558994092]

言語:

英語

請求記号:

M23500/504

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018916
シリーズID:	PA00000011
会議名:	Symposium on atomistic mechanisms in beam synthesis and irradiation of materials
回次:	1997
会議開催地:	Boston, MA, USA
会議開催年:	1997.12.01-1997.12.02

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