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High-Quality Oxide Film Formation by O2 Cluster Ion Assisted Deposition Technique

著者名:
掲載資料名:
Atomistic mechanisms in beam synthesis and irradiation of materials : symposium held December 1-2, 1997, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
504
発行年:
1999
開始ページ:
87
出版情報:
Warrendale, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994096 [1558994092]
言語:
英語
請求記号:
M23500/504
資料種別:
国際会議録

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