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Reactive Ion Etching (RIE)-Induced p- to n-Type Conversion in Extrinsically-Doped p-Type HgCdTe

著者名:
Musca, C. A.
Smith, E. P. G.
Siliquini, J. F.
Dell, J. M.
Antoszewski, J.
Piotrowski, J.
Faraone, L.
さらに 2 件
掲載資料名:
Infrared applications of semiconductors II : symposium held December 1-4, 1997, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
484
発行年:
1998
開始ページ:
353
出版情報:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993891 [1558993894]
言語:
英語
請求記号:
M23500/484
資料種別:
国際会議録

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