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Damage characterization of SiN x-ray mask membrane caused by electron-beam exposure

著者名:
Choi,S.-S. ( Electronics and Telecommunications Research Institute )
Jeon,Y.J.
Kim,J.-S.
Chung,H.B.
Lee,S.Y.
Lee,J.H.
Yoo,H.J.
さらに 2 件
掲載資料名:
Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
2723
発行年:
1996
開始ページ:
321
終了ページ:
331
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819420992 [0819420999]
言語:
英語
請求記号:
P63600/2723
資料種別:
国際会議録

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