New electron-beam mask-writing system for 0.25-ヲフm lithography
- 著者名:
Satoh,H. ( Hitachi Central Research Lab. ) Someda,Y. Saitou,N. Kawasaki,K. Itoh,H. Mizuno,K. - 掲載資料名:
- Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2723
- 発行年:
- 1996
- 開始ページ:
- 102
- 終了ページ:
- 111
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819420992 [0819420999]
- 言語:
- 英語
- 請求記号:
- P63600/2723
- 資料種別:
- 国際会議録
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