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Novel GOI Failure Analysis Using SEM/MOS/EBIC with SubNano Ampere Current Breakdown

著者名:
掲載資料名:
Proceedings of the Electrochemical Society Symposium on Diagnostic Techniques for Semiconductor Materials and Devices
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3322
発行年:
1997
開始ページ:
80
終了ページ:
91
出版情報:
Pennington, NJ: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427656 [0819427659]
言語:
英語
請求記号:
P63600/3322
資料種別:
国際会議録

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