Implementation of a closed-loop CD and overlay controller for sub-0.25-ヲフm patterning
- 著者名:
Sturtevant,J.L. ( Motorola ) Weilemann,M.R. ( Motorola ) Green,K.G. ( Motorola ) Dwyer,J. ( Motorola ) Robertson,E. ( Motorola ) Hershey,R.R. ( Motorola ) - 掲載資料名:
- Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3332
- 発行年:
- 1998
- 開始ページ:
- 461
- 終了ページ:
- 470
- 出版情報:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427779 [0819427772]
- 言語:
- 英語
- 請求記号:
- P63600/3332
- 資料種別:
- 国際会議録
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Integration of Multi-Level Copper Metallization into a High-Performance Sub-0.25 ヲフm Technology
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Mask CD quality assurance specifications for 0.25-ヲフm devices with a practical lithography window
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