Refractive index measurements of photoresist and antireflective coatings with variable-angle spectroscopic ellipsometry
- 著者名:
- Synowicki,R.A. ( J. A. Woollam Co.,Inc. )
- Hilfiker,J.N. ( J. A. Woollam Co.,Inc. )
- Dammel,R.R. ( Clariant Corp. )
- Henderson,C.L. ( Univ.of Texas at Austin )
- 掲載資料名:
- Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3332
- 発行年:
- 1998
- 開始ページ:
- 384
- 終了ページ:
- 390
- 出版情報:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427779 [0819427772]
- 言語:
- 英語
- 請求記号:
- P63600/3332
- 資料種別:
- 国際会議録
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SPIE - The International Society for Optical Engineering |
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Application of spectroscopic ellipsometry to characterization of optical thin films (Invited Paper)
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Photoresist characterization for lithography simulation:III.Development parameter measurements
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