Toward a unified advanced CD-SEM specification for sub-0.18-ヲフm technology
- 著者名:
Allgair,J. ( Motorola ) Archie,C.N. ( IBM Corp. ) Banke,W. ( IBM Corp. ) Bogardus,H. ( SEMATECH ) Griffith,J.E. ( Lucent Technologies/Bell Labs. ) Marchman,H.M. ( Texas Instruments Inc. ) Postek,M.T. ( National Institute of Standards and Technology ) Saraf,L.H. ( SEMATECH ) Schlesinger,J.E. ( Texas Instruments Inc. ) Singh,B. ( Advanced Micro Devices,Inc. ) Sullivan,N.T. ( Digital Equipment Corp. ) Trimble,L.E. ( Lucent Technologies/Bell Labs. ) Vladar,A.E. ( Hewlett-Packard Co. ) Yanof,A.W. ( Motorola ) - 掲載資料名:
- Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3332
- 発行年:
- 1998
- 開始ページ:
- 138
- 終了ページ:
- 150
- 出版情報:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427779 [0819427772]
- 言語:
- 英語
- 請求記号:
- P63600/3332
- 資料種別:
- 国際会議録
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