Comparison of properties of electrical test structures patterned in BESOI and SIMOX films for CD reference-material applications

Comparison of properties of electrical test structures patterned in BESOI and SIMOX films for CD reference-material applications

著者名:

Allen,R.A. ( National Institute of Standards and Technology )
Ghoshtagore,R.N. ( National Institute of Standards and Technology )
Cresswell,M.W. ( National Institute of Standards and Technology )
Linholm,L.W. ( National Institute of Standards and Technology )
Sniegowski,J.J. ( Sandia National Labs. )

掲載資料名:

Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3332

発行年:

1998

開始ページ:

124

終了ページ:

131

出版情報:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427779 [0819427772]

言語:

英語

請求記号:

P63600/3332

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018777
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology,Inspection, and Process Control for Microlithograph
回次:	1998 : 12th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1998.02.23-1998.02.25

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