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Anisotropic etching of (111)-oriented silicon and applications

著者名:
  • Chou,B.C.S. ( Precision Instrument Development Ctr. (Taiwan) )
  • Chen,C.-N. ( National Chiao Tung Univ.(Taiwan) )
  • Shie,J.-S. ( National Chiao Tung Univ.(Taiwan) )
  • Huang,W.-H. ( Precision Instrument Development Ctr. (Taiwan) )
  • Chen,C.-J. ( Precision Instrument Development Ctr. (Taiwan) )
掲載資料名:
Micromachining and microfabrication process technology IV : 21-22 September, 1998, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3511
発行年:
1998
開始ページ:
337
終了ページ:
341
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819429704 [0819429708]
言語:
英語
請求記号:
P63600/3511
資料種別:
国際会議録

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