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Planarization and trench filling on severe surface topography with thick photoresist for MEMS

著者名:
  • Yoon,J.-B. ( Korea Advanced Institute of Science and Technology )
  • Oh,G.Y. ( Korea Advanced Institute of Science and Technology )
  • Han,C.-H ( Korea Advanced Institute of Science and Technology )
  • Yoon,E. ( Korea Advanced Institute of Science and Technology )
  • Kim,C.-K. ( Korea Advanced Institute of Science and Technology )
掲載資料名:
Micromachining and microfabrication process technology IV : 21-22 September, 1998, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3511
発行年:
1998
開始ページ:
297
終了ページ:
306
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819429704 [0819429708]
言語:
英語
請求記号:
P63600/3511
資料種別:
国際会議録

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