Improvements in Ultra-Thin Gate Oxide Thickness Metrology Using Rapid Optical Surface Treatment

Improvements in Ultra-Thin Gate Oxide Thickness Metrology Using Rapid Optical Surface Treatment

著者名:

Newcomb,R.

掲載資料名:

Analytical and diagnostic techniques for semiconductor materials, devices and processes : joint proceedings of the symposia on ALTECH 99, satellite symposium to ESSDERC 99, Leuven, Belgium [and] the Electrochemical Society Symposium on Diagnostic Techniques for Semiconductor Materials and Devices

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3895

発行年:

1999

開始ページ:

441

終了ページ:

449

出版情報:

Pennington, N.J.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819434975 [0819434973]

言語:

英語

請求記号:

P63600/3895

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018561
シリーズID:	PA00000029
会議名:	ALTECH ; ESSDERC ; Electrochemical Society Symposium on Diagnostic Techniques for Semiconductor Materials and Devices
回次:	1999
会議開催地:	Leuven, Belgium
会議開催年:	1999.00.00

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