Analysis of Selectively Grown Epitaxial Si1-xGex by Spectroscopic Ellipsometry and Comparison with RBS and SIMS
- 著者名:
Loo,R. Caymax,M. Libezny,M. Blavier,G. Brijs,B. Geene,L. Vandervorst,W. - 掲載資料名:
- Analytical and diagnostic techniques for semiconductor materials, devices and processes : joint proceedings of the symposia on ALTECH 99, satellite symposium to ESSDERC 99, Leuven, Belgium [and] the Electrochemical Society Symposium on Diagnostic Techniques for Semiconductor Materials and Devices
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3895
- 発行年:
- 1999
- 開始ページ:
- 170
- 終了ページ:
- 179
- 出版情報:
- Pennington, N.J.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819434975 [0819434973]
- 言語:
- 英語
- 請求記号:
- P63600/3895
- 資料種別:
- 国際会議録
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