Blank Cover Image

Characterization of Mechanical Stresses of Device Isolation Structures by Micro-Raman Spectroscopy and Modelling

著者名:
Joncs,S.K.
Allmed,M.
Bazley,D.J.
Beanlan,R.J.
Wolf,I.De
Hill,C.
Rothwell,W.J.
さらに 2 件
掲載資料名:
Analytical and diagnostic techniques for semiconductor materials, devices and processes : joint proceedings of the symposia on ALTECH 99, satellite symposium to ESSDERC 99, Leuven, Belgium [and] the Electrochemical Society Symposium on Diagnostic Techniques for Semiconductor Materials and Devices
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3895
発行年:
1999
開始ページ:
60
終了ページ:
75
出版情報:
Pennington, N.J.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819434975 [0819434973]
言語:
英語
請求記号:
P63600/3895
資料種別:
国際会議録

類似資料:

1 国際会議録 Experimental one-and two-dimensional mechanical stress characterization of silicon microsystems using micro-Raman spectroscopy

Spengen,W.M.van, Wolf,I.De, Knechtel,R.

SPIE-The International Society for Optical Engineering
7 国際会議録 Stress in Silicon Due to the Formation of Self Aligned Poly-CoSi2 Lines Studied by Micro-Raman Spectroscopy

Howard, D. J., Wolf, I. De, Bender, H., Maex, K.

MRS - Materials Research Society
2 国際会議録 High-resolution stress and temperature measurements in semiconductor devices using micro-Raman spectroscopy

Wolf,I.De, Chen,J., Rasras,M., Spengen,W.M.van, Simons,V.

SPIE - The International Society for Optical Engineering
8 国際会議録 The dynamic stress in micro-structures studied by Raman spectroscopy [6344-92]

Xue, C., Zheng, L., Xiong, J., Zhang, W., Sang, S.

SPIE - The International Society of Optical Engineering
3 国際会議録 Phase and Mechanical Stress in and Surrounding TiSi2 and CoSi2 Lines Studied by Micro-Raman Spectroscopy

Wolf, I. De, Howard, D. J., Maex, K., Maes, H. E.

MRS - Materials Research Society
9 国際会議録 Characterization of II-VI Structures by Raman Spectroscopy(invited)

Zahn,D.R.T., Geurts,J., Richter,W.

Trans Tech Publications
4 国際会議録 Analysis of Process-Induced Stresses in Lateral Trench Isolation Structures for High Voltage Devices in Bonded SOI Wafers

Baumgart, H., Letavic, T.J., Wolf, I.De., Tsou, L., Maes, H.E., Egloff, R.

Electrochemical Society
10 国際会議録 High-speed 3D optical imaging and failure analysis of high-and low-frequency movements in micro-electro-mechanical (MEMS) with nanometer resolution

Spengen,W.M.van, Wolf,I.De, Puers,R.

SPIE-The International Society for Optical Engineering
5 国際会議録 VARIATION OF LOCAL MECHANICAL STRESS DURING THE DIFFERENT PROCESSING STEPS OF IC-ISOLATION: A MICRO-RAMAN SPECTROSCOPY STUDY

Wolf, Ingrid De, Maes, Herman E., Norstrom, Hans

MRS - Materials Research Society
11 国際会議録 Residual Stresses in Tungsten Lines: Analysis of Experimental- (Micro-Raman Spectroscopy, XRD) and Numerical Results

Wolf, I. De, Maes, H. E., Moffet, J., Ignat, M.

MRS - Materials Research Society
6 国際会議録 Towards Two Dimensional Micro-Raman Analysis of Semiconductor Materials and Devices (abstract only)

Wakefield B., Rothwell J. W.

Plenum Press
12 国際会議録 The Chemical-Mechanical Polishing of Copper with Model Slurries

Lee, B-C., Duquette, D.J., Gutmann, R.J.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12