Scale-up of a cluster jet laser plasma source for extreme ultraviolet lithography

Scale-up of a cluster jet laser plasma source for extreme ultraviolet lithography

著者名:

Kubiak,G.D. ( Sandia National Labs. )
Bernardez,L.J.
Krenz,K.D.
Sweatt,W.C.

掲載資料名:

Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3676

発行年:

1999

巻:

Part2

開始ページ:

669

終了ページ:

678

出版情報:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819431509 [0819431508]

言語:

英語

請求記号:

P63600/3676

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018541
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging lithographic technologies
回次:	1999 : 3rd
会議開催地:	Santa Clara, CA, USA
会議開催年:	1999.03.15-1999.03.17

類似資料:

1 国際会議録 High-power source and illumination system for extreme ultraviolet lithography Kubiak,G.D., Bernardez,L.J., Krenz,K D., Replogle,W.C., Sweatt,W.C., Sweeney,D.W., Hudyma,R.M., Shields,H. SPIE - The International Society for Optical Engineering	7 国際会議録 Measurement of mid-spatial-frequency scatter in extreme ultraviolet lithography systems using direct aerial image measurements Fields,C.H., Ray-Chaudhuri,A.K., Krenz,K.D., Oldham,W.G., Stulen,R.H. SPIE-The International Society for Optical Engineering
2 国際会議録 High-power extreme-ultraviolet source based on gas jets Kubiak,G.D., Bernardez II,L.J., Krenz,K.D. SPIE-The International Society for Optical Engineering	8 国際会議録 Scaling-up a liquid water jet laser plasma source to high average power for extreme-ultraviolet lithography Vogt,U., Stiel,H., Will,I., Wieland,M., Wilhein,T., Nickles,P.V., Sandner,W. SPIE-The International Society for Optical Engineering
3 国際会議録 EUV absorption in a laser-produced plasma source Kanouff,M.P., Shields,H., Bernardez,L.J., Kubiak,G.D. SPIE-The International Society for Optical Engineering	9 国際会議録 X-RAY LITHOGRAPHY STUDIES OF POLYSILANE USING A LASER PLASMA X-RAY SOURCE Kubiak, G.D., Outka, D.A., Zeigler, J.M. Materials Research Society
4 国際会議録 Power scale-up of the extreme-ultraviolet electric capillary discharge source Fornaciari, N.R., Bender, H., Buchenauer, D., Dimkoff, J.L., Kanouff, M.P., Karim, S., Romeo, C., Shimkaveg, G.M., … SPIE-The International Society for Optical Engineering	10 国際会議録 Development of compact extreme ultraviolet interferometry for on-line testing of lithography cameras A.K. Ray-Chaudhuri, R.P. Nissen, K.D. Krenz, R.H. Stulen Society of Photo-optical Instrumentation Engineers
5 国際会議録 Development of a high-average-power extreme-ultraviolet electric capillary discharge source Fornaciari,N.R., Bender,H., Buchenauer,D., Kanouff,M.P., Karim,S., Kubiak,G.D., Moen,C.D., Shimkaveg,G.M., … SPIE-The International Society for Optical Engineering	11 国際会議録 Masks for extreme ultraviolet lithography Vernon,S.P., Kearney,P.A., Tong,W.M., Prisbrey,S., Larson,C., Moore,C.E., Weber,F.J., Cardinale,G.F., Yan,P., … SPIE - The International Society for Optical Engineering
6 国際会議録 Recent advances in the Sandia EUV 10x microstepper (Invited Paper) Goldsmith,J.E.M., Wronosky,J.B., Barr,P.K., Berger,K.W., Bernardez II,L.J., Cardinale,G.F., Darnold,J.R., Folk,D.R., … SPIE-The International Society for Optical Engineering	12 国際会議録 Extreme ultraviolet lithography for circuit fabrication at 0.1-µm feature size D.A. Tichenor, G.D. Kubiak, R.H. Stulen Society of Photo-optical Instrumentation Engineers

1

2

3

4

5

6

7

8

9

10

11

12