Modal analysis of the SCALPEL mask using experimental and numerical methods

Modal analysis of the SCALPEL mask using experimental and numerical methods

著者名:

Semke,W.H. ( Univ.of Wisconsin/Madison )
Schlax,M.P.
Engelstad,R.L.
Lovell,E.G.
Liddle,J.A.

掲載資料名:

Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3676

発行年:

1999

巻:

Part2

開始ページ:

556

終了ページ:

567

出版情報:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819431509 [0819431508]

言語:

英語

請求記号:

P63600/3676

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018541
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging lithographic technologies
回次:	1999 : 3rd
会議開催地:	Santa Clara, CA, USA
会議開催年:	1999.03.15-1999.03.17

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