Predicting mechanical distortions in x-ray masks

Predicting mechanical distortions in x-ray masks

著者名:

Cotte,E.P. ( Univ.of Wisconsin/Madison )
Engelstad,R.L.
Lovell,E.G.
Brooks,C.J.

掲載資料名:

Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3676

発行年:

1999

巻:

Part2

開始ページ:

429

終了ページ:

440

出版情報:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819431509 [0819431508]

言語:

英語

請求記号:

P63600/3676

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018541
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging lithographic technologies
回次:	1999 : 3rd
会議開催地:	Santa Clara, CA, USA
会議開催年:	1999.03.15-1999.03.17

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3 国際会議録 Transient thermal distortions of x-ray mask membranes during exposure scanning Feng,Z., Engelstad,R.L., Lovell,E.G., Cerrina,F. SPIE-The International Society for Optical Engineering	9 国際会議録 Predicting local thermomechanical distortions of the 200-mm EPL mask system Lee, P.-T., Engelstad, R.L., Lovell, E.G., Kawata, S., Hirayanagi, N., Sogard, M.R. SPIE-The International Society for Optical Engineering
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