High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV lithography

High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV lithography

著者名:

Silfvast,W.T. ( CREOL/Univ.of Central Florida )

掲載資料名:

Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3676

発行年:

1999

巻:

Part1

開始ページ:

272

終了ページ:

275

出版情報:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819431509 [0819431508]

言語:

英語

請求記号:

P63600/3676

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018541
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging lithographic technologies
回次:	1999 : 3rd
会議開催地:	Santa Clara, CA, USA
会議開催年:	1999.03.15-1999.03.17

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