Finite element modeling of SCALPEL masks
- 著者名:
Engelstad,R.L. ( Univ.of Wisconsin/Madison ) Lovell,E.G. Dicks,G.A. Martin,C.J. Schlax,M.P. Semke,W.H. Liddle,J.A. Novembre,A.E. - 掲載資料名:
- Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3676
- 発行年:
- 1999
- 巻:
- Part1
- 開始ページ:
- 128
- 終了ページ:
- 139
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431509 [0819431508]
- 言語:
- 英語
- 請求記号:
- P63600/3676
- 資料種別:
- 国際会議録
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9
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Comparison of substrate curvature and resonant frequency thin film stress mapping techniques
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