Design and analysis of across-chip linewidth variation for printed features at 130 nm and below
- 著者名:
Chen,J.F. ( ASML MaskTools,Inc. ) Socha,R.J. Puntambekar,K. Wampler,K.E. Caldwell,R.F. Dusa,M.V. Love,J.C. Yeric,G. Stoner,B. - 掲載資料名:
- Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3998
- 発行年:
- 2000
- 開始ページ:
- 168
- 終了ページ:
- 177
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436160 [081943616X]
- 言語:
- 英語
- 請求記号:
- P63600/3998
- 資料種別:
- 国際会議録
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3
国際会議録
Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |