Comparison of electrical CD measurements and cross-section lattice-plane counts of submicrometer features replicated in(100)silicon-on-insulator material
- 著者名:
Cresswell,M.W. ( National Institute of Standards and Technology ) Bonevich,J.E. Headley,T.J. Allen,R.A. Giannuzzi,L.A. Everist,S.C. Ghoshtagore,R.N. Shea,P.J. - 掲載資料名:
- Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3998
- 発行年:
- 2000
- 開始ページ:
- 74
- 終了ページ:
- 83
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436160 [081943616X]
- 言語:
- 英語
- 請求記号:
- P63600/3998
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
American Institute of Aeronautics and Astronautics |
Society of Photo-optical Instrumentation Engineers |
MRS - Materials Research Society |
MRS - Materials Research Society |
Plenum Press |