Blank Cover Image

Benchmarking of advanced CD-SEMs against the new unified specification for sub-0.18-ｦﾌm lithography

著者名:
Deleporte,A.G. ( International SEMATECH )
Allgair,J.
Archie,C.N.
Banke,G.W.
Postek,M.T.
Schlesinger,J.E.
Vladar,A.E.
Yanof,A.W.
さらに 3 件
掲載資料名:
Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3998
発行年:
2000
開始ページ:
12
終了ページ:
27
出版情報:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436160 [081943616X]
言語:
英語
請求記号:
P63600/3998
資料種別:
国際会議録

類似資料:

1 国際会議録 Benchmarking of advanced CD-SEMs against a new unified specification for sub-0.18-μm lithography

Deleporte,A.G., Allgair,J., Archie,C.N., Banke,G.W., Postek,M.T., Schlesinger,J.E., Vladar,A.E., Yanof,A.W.

SPIE-The International Society for Optical Engineering
7 国際会議録 New apparent beam width artifact and measurement methodology for CD-SEM resolution monitoring

Mayer, J.A., Huizenga, K.J., Solecky, E.P., Archie, C.N., Banke, G.W. Jr.,, Cogley, R.M., Nathan, C., Robert, J.M.

SPIE-The International Society for Optical Engineering
2 国際会議録 Toward a unified advanced CD-SEM specification for sub-0.18-ｦﾌm technology

Allgair,J., Archie,C.N., Banke,W., Bogardus,H., Griffith,J.E., Marchman,H.M., Postek,M.T., Saraf,L.H., Schlesinger,J.E., …

SPIE-The International Society for Optical Engineering
8 国際会議録 SEM sentinel-SEM performance measurement system

Damazo,B.N., Vladar,A.E., Ling,A.V., Donmez,M., Postek,M.T., Jayewardene,E.C.

SPIE-The International Society for Optical Engineering
3 国際会議録 Simulation study of repeatability and bias in the CD-SEM (Invited Paper)

Villarrubia, J.S., Vladar, A.E., Postek, M.T.

SPIE-The International Society for Optical Engineering
9 国際会議録 Contamination specification for dimensional metrology SEMs

A. E. Vladár, K. P. Purushotham, M. T. Postek

Society of Photo-optical Instrumentation Engineers
4 国際会議録 Monitoring printing fidelity with image correlation measurements on the CD SEM

Archie,C.N., Solecky,E.P., Hayes,T.S., Banke,G.W.

SPIE-The International Society for Optical Engineering
10 国際会議録 Mask CD control requirement at 0.18-ｦﾌm design rules for 193-nm lithography

Yan,P., Langston,J.C.

SPIE-The International Society for Optical Engineering
5 国際会議録 Characterization of CD control for sub-0.18-ｦﾌm lithographic patterning

Sturtevant,J.L., Allgair,J., Fu,C.-C., Green,K.G., Hershey,R.R., Kling,M.E., Litt,L.C., Lucas,K.D., Roman,B.J., …

SPIE - The International Society for Optical Engineering
11 国際会議録 Correlating scatterometry to CD-SEM and electrical gate measurements at the 90-nm node using TMU analysis

Sendelbach, M., Archie, C.N., Banke, B., Mayer, J., Nii, H., Herrera, P., Hankinson, M.

SPIE - The International Society of Optical Engineering
6 国際会議録 SEM performance evaluation using the sharpness criterion

Postek,M.T., Vladar,A.E.

SPIE-The International Society for Optical Engineering
12 国際会議録 Potentials for high pressure/environmental SEM microscopy for photomask dimensional metrology

Postek, M.T., Vladar, A.E., Rice, T.M., Knowles, R.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12