LOW TEMPERATURE EPITAXIAL GROWTH OF TiO2 RUTILE FILMS BY ICB DEPOSITION AND MECHANICAL PROPERTIES IN HELIUM IMPLANTED RUTILE FILMS

LOW TEMPERATURE EPITAXIAL GROWTH OF TiO2 RUTILE FILMS BY ICB DEPOSITION AND MECHANICAL PROPERTIES IN HELIUM IMPLANTED RUTILE FILMS

著者名:

掲載資料名:

Materials synthesis and processing using ion beams : symposium held November 29-December 3, 1993, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

316

発行年:

1994

開始ページ:

905

出版情報:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558992153 [1558992154]

言語:

英語

請求記号:

M23500/316

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018464
シリーズID:	PA00000011
会議名:	Symposium on materials synthesis and processing using ion beams
回次:	1993
会議開催地:	Boston, MA, USA
会議開催年:	1993.11.29-1993.12.03

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