MASK TECHNOLOGY FOR X-RAY NANOLITHOGRAPHY | 東京工業大学附属図書館文献データベース

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MASK TECHNOLOGY FOR X-RAY NANOLITHOGRAPHY

著者名:

Schattenburg, M. L.

Ghanbari, R. A.

Smith, Henry I.

さらに 3 件

掲載資料名:

Materials aspects of x-ray lithography : symposium held April 12-14, 1993, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

306

発行年:

1993

開始ページ:

63

出版情報:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558992023 [1558992022]

言語:

英語

請求記号:

M23500/306

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018463
シリーズID:	PA00000011
会議名:	Symposium on materials aspects of x-ray lithography
回次:	1993
会議開催地:	San Francisco, CA, USA
会議開催年:	1993.04.12-1993.04.14

類似資料:

1 国際会議録 X-Ray Nanolithography: Limits, and Applications to Sub-100 nm Manufacturing Smith H. I., Schattenburg M. L. Kluwer Academic Publishers	7 国際会議録 Mask technology for EUV lithography Bujak,M., Burkhart,S.C., Cerjan,C.J., Kearney,P.A., Moore,C.E., Prisbrey,S., Sweeney,D.W., Tong,W.M., Vernon,S.P., … SPIE - The International Society for Optical Engineering
2 国際会議録 *Soft X-rays for deep sub-100 nm lithography, with and without masks Smith, Henry I., Carter, D. J.D., Ferrera, J., Gil, D., Goodberlet, J., Hastings, J. T., Lim, M. H., Meinhold, M., … MRS-Materials Research Society	8 国際会議録 Catalytic Combustion Technology Development for Gas Turbine Engine Applications Carter, R. N., Smith, L. L., Karim, H., Castaldi, M., Etemad, S., Muench, G., Boorse, R. S., Menacherry, P., Pfefferle, … MRS - Materials Research Society
3 国際会議録 MASKLESS SINGLE-SIDED WET ETCHING PROCESS FOR THE FABRICATION OF ULTRA-LOW DISTORTION POLYIMIDE MEMBRANES Schattenburg, M. L., Fuentes, R. I., Czernienko, G., Fleming, R. C., Porter, J. MRS - Materials Research Society	9 国際会議録 X-ray mask fabrication at CXrL Leonard,Q.J., Bansel,J., Yang,L., Vladimirsky,O., Bollepalli,B.S., Khan,M., Vladimirsky,Y., Cerrina,F., Taylor,J.W., … SPIE - The International Society for Optical Engineering
4 国際会議録 Production of SCALPEL masks in a commercial mask facility Newport,C.L., Parker,J., Smith,K.M., Benveniste,A., Kim,N.-W., Reyland,D., Farrow,R.C., Novembre,A.E., Kasica,R.J., … SPIE - The International Society for Optical Engineering	10 国際会議録 Photon sieve array x-ray maskless nanolithography G. Cheng, T. Xing, W. Lin, J. Zhou, C. Qiu, Z. Liao, Y. Yang, L. Hong, J. Ma SPIE - The International Society of Optical Engineering
5 国際会議録 HIGH RESOLUTION X-RAY SPECTROSCOPY FROM THE EINSTEIN OBSERVATORY Winkler F. P., Canizares R. C., Clark W. G., Markert H. T., Berg C., Jernigan C. J., Schattenburg L. M. D. Reidel	11 国際会議録 High transmission mask technology for 45nm node imaging [6154-38] Conley, W., Morgana, N., Kasprowicz, B. S., Cangemi, M., Lassiter, M., Litt, L. C., Cottle, R., Wu, W., Cobb, J., Ham, … SPIE - The International Society of Optical Engineering
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