Blank Cover Image

Dose-Dependent "Activation Energy" for Blistering Phenomenon in Hydrogen-Implanted Silicon

著者名:
掲載資料名:
Hydrogen in semiconductors and metals : symposium held April 13-17, 1998, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
513
発行年:
1998
開始ページ:
369
出版情報:
Warrendale, Penn.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994195 [155899419X]
言語:
英語
請求記号:
M23500/513
資料種別:
国際会議録

類似資料:

1 国際会議録 Blistering and Splitting in Hydrogen-Implanted Silicon

Ntsoenzok, E., Assaf, H., Ashok, S.

Materials Research Society
7 国際会議録 Layer Transfer of Hydrogen-Implanted Silicon Wafers by Thermal-Microwave Co-Activation

Y. Y. Yang, C. H. Huang, Y. -K. Hsu, S. -J. Jeng, C. -C. Tai, S. Lee, H. -W. Chen, Q. Gan, C. -S. Chu, J. -H. Ting, C. …

Materials Research Society
2 国際会議録 Activation Energy and Blistering Rate in Hydrogen-implanted Semiconductors

Daniel J. Pyke, Robert G. Elliman, Jeffrey C. McCallum

Materials Research Society
8 国際会議録 Calibration Of Phosphorus Implantation Dose In Silicon By Radiochemical Neutron Activation Analysis

Paul, Rick L., Simons, David S.

Materials Research Society
3 国際会議録 THE EFFECTS OF HIGH AND LOW DOSE HYDROGEN ION IMPLANTATIONS ON Al/n-Si SCHOTTKY DIODES

Yapsir, A. S., Hadizad, P., Lu, T. -M., Corelli, J. C., Corbett, J. W., Lanford, W. A., Bakhru, H.

Materials Research Society
9 国際会議録 Isotope and Dose Effects in Low-Energy H/D Blistering of Silicon: Narrow Operational Window for Ion-Cutting at<100 nm

Moutanabbir, O., Terreault, B., Shaffer, E., Ross, G.G.

Materials Research Society
4 国際会議録 Homogenization of the Bilayers of Cu-Al Alloy and Pure Copper to Produce Cu-0.3 at.% Al Alloy Films

Wang, Pei-I, Murarka, S. P., Bedell, S., Lanford, W. A.

MRS - Materials Research Society
10 国際会議録 A MODEL FOR BLISTERING AND SPLITI'ING OF HYDROGEN IMPLANTED SILICON AND ITS APPLICATION TO SILICON-ON-QUARTZ

Huang, L.-J., Tong, Q.-Y., Lee, T.-H., Chao, Y.-L., Goesele, U.M.

Electrochemical Society
5 国際会議録 Capacitance-Voltage, Current Voltage, and Thermal Stability of Copper Alloyed with Aluminum or Magnesium

Felipe, T. Suwwan de, Murarka, S. P., Bedell, S., Lanford, W. A.

MRS - Materials Research Society
11 国際会議録 ION IMPLANTATION TO INHIBIT CORROSION OF COPPER

Ding, P. J., Lanford, W. A., Hymes, S., Murarka, S. P.

Materials Research Society
6 国際会議録 Effect of Elevated Implant Temperature on Amorphization and Activation in As-implanted Silicon-on-insulator Layers

Katherine L. Saenger, Stephen W. Bedell, Matthew Copel, Amlan Majumdar, John A. Ott, Joel P. de Souza, Steven J. …

Materials Research Society
12 国際会議録 ION IMPLANTATION TO INHIBIT CORROSION OF COPPER

Ding, P. J., Lanford, W. A., Hymes, S., Murarka, S. P.

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12