High-Rate ECR Plasma Etching of Cu at Room Temperature in Cl2/Ar

High-Rate ECR Plasma Etching of Cu at Room Temperature in Cl2/Ar

著者名:

Jung, K-B.

掲載資料名:

Structure and evolution of surfaces : symposium held December 2-5, 1996, Boston, Massachusette, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

440

発行年:

1997

開始ページ:

449

出版情報:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993440 [1558993444]

言語:

英語

請求記号:

M23500/440

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018450
シリーズID:	PA00000011
会議名:	Symposium on structure and evolution of surfaces
回次:	1996
会議開催地:	Boston, MA, USA
会議開催年:	1996.12.02-1996.12.05

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