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Deposition of Thin SiO2 Films on Polymers as a Hard-Coating Using a Microwave-ECR Plasma

著者名:
Sano, K.
Tamamaki, H.
Nomura, M.
Wickramanayaka, S.
Nakanishi, Y.
Hatanaka, Y.
さらに 1 件
掲載資料名:
Microwave processing of materials V : symposium held April 8-12, 1996, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
430
発行年:
1996
開始ページ:
647
出版情報:
Pittsburgh,, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993334 [1558993339]
言語:
英語
請求記号:
M23500/430
資料種別:
国際会議録

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