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Phase Separation by Rapid Thermal Annealing in Si-Sub-Oxides and -Nitrides Formed by Plasma CVD

著者名:
掲載資料名:
Amorphous silicon technology, 1996 : symposium held April 8-12, 1996, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
420
発行年:
1996
開始ページ:
405
出版情報:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993235 [1558993231]
言語:
英語
請求記号:
M23500/420
資料種別:
国際会議録

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