Critical dimension photomask metrology tool requirements for 0.25-ｦﾌm and future microlithography

Critical dimension photomask metrology tool requirements for 0.25-ｦﾌm and future microlithography

著者名:

Schmidt,M. ( Intel Corp. )
Tran,A.

掲載資料名:

16th Annual BACUS Symposium on Photomask Technology and Management

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2884

発行年:

1996

開始ページ:

208

終了ページ:

218

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819422828 [0819422827]

言語:

英語

請求記号:

P63600/2884

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018423
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual Symposium on Photomask Technology and Management
回次:	1996 : 16th
会議開催地:	Redwood City, California, USA
会議開催年:	1996.09.18-1996.09.20

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