Study of Damaged Top Layers of Silicon Crystals Produced by BF2+ Implantation by High Resolution X-ray Diffraction

Study of Damaged Top Layers of Silicon Crystals Produced by BF2+ Implantation by High Resolution X-ray Diffraction

著者名:

掲載資料名:

Semiconductor Devices

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2733

発行年:

1996

開始ページ:

493

終了ページ:

495

出版情報:

Bellingham, WA — New Delhi: SPIE-The International Society for Optical Engineering — Narosa

ISSN:

0277786X

ISBN:

9780819421142 [0819421146]

言語:

英語

請求記号:

P63600/2733

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018408
シリーズID:	PA00000029

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