Si selective epitaxial growth technology using UHV-CVD and its application to LSI fabrication (Invited Paper)
- 著者名:
- Shishiguchi,S. ( NEC Corp. (Japan) )
- Yasunaga,T. ( NEC Corp. (Japan) )
- Aoyama,T. ( NEC Corp. (Japan) )
- Tatsumi,T. ( NEC Corp. (Japan) )
- Saito,S. ( NEC Corp. (Japan) )
- 掲載資料名:
- Microelectronic Device Technology : 1-2 October 1997, Austin, Texas
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3212
- 発行年:
- 1997
- 開始ページ:
- 106
- 終了ページ:
- 117
- 出版情報:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819426444 [081942644X]
- 言語:
- 英語
- 請求記号:
- P63600/3212
- 資料種別:
- 国際会議録
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Electrochemical Society |
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Trans Tech Publications |
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
Electrochemical Society |
SPIE - The International Society for Optical Engineering |
Trans Tech Publications |
Materials Research Society |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |