Some aspects of thick film resist performance and modeling
- 著者名:
- Erdmann,A. ( Fraunhofer Institute for Silicon Technology (FRG) )
- Henderson,C.L. ( Univ.of Texas at Austin )
- Willson,C.G. ( Univ.of Texas at Austin )
- Dammel,R.R. ( Clariant Corp. )
- 掲載資料名:
- Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3333
- 発行年:
- 1998
- 巻:
- Part 2
- 開始ページ:
- 1201
- 終了ページ:
- 1211
- 出版情報:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427786 [0819427780]
- 言語:
- 英語
- 請求記号:
- P63600/3333
- 資料種別:
- 国際会議録
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