Lithographic evaluation of deep-UV photoresists for 0.25-and 0.18-ヲフm technology design rules
- 著者名:
- Amblard,G.R. ( CNET/SGS-Thomson (France) )
- 掲載資料名:
- Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3333
- 発行年:
- 1998
- 巻:
- Part 2
- 開始ページ:
- 890
- 終了ページ:
- 908
- 出版情報:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427786 [0819427780]
- 言語:
- 英語
- 請求記号:
- P63600/3333
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
国際会議録
Plasma etch of AZ5206/Cr and ZEP7000/Cr for 0.18- to 0.25-ヲフm-generation advanced mask fabrication
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
12
国際会議録
Integration of Multi-Level Copper Metallization into a High-Performance Sub-0.25 ヲフm Technology
MRS - Materials Research Society |