Advanced negative resists using novel aminoplast crosslinkers
- 著者名:
Afzali,A. ( IBM Thomas J. Watson Research Ctr. ) Gelorme,J.D. ( IBM Thomas J. Watson Research Ctr. ) Kosbar,L.L. ( IBM Thomas J. Watson Research Ctr. ) Neisser,M.O. ( IBM Microelectronics Div. ) Brunswold,W. ( IBM Microelectronics Div. ) Feild,C. ( IBM Microelectronics Div. ) Lawson,M. ( IBM Microelectronics Div. ) Varanasi,R. ( IBM Microelectronics Div. ) - 掲載資料名:
- Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3333
- 発行年:
- 1998
- 巻:
- Part 1
- 開始ページ:
- 758
- 終了ページ:
- 767
- 出版情報:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427786 [0819427780]
- 言語:
- 英語
- 請求記号:
- P63600/3333
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
12
国際会議録
Thin-Film Transistors Based on Spin-Coated Chalcogenide Semiconductor Channels Invited Paper
Electrochemical Society |