Monitoring photoacid generation in chemically amplified resist systems

Monitoring photoacid generation in chemically amplified resist systems

著者名:

Okoroanyanwu,U. ( Univ.of Texas at Austin )
Byers,J.D. ( SEMATECH )
Cao,T. ( Univ.of Texas at Austin )
Webber,S.E. ( Univ.of Texas at Austin )
Willson,C.G. ( Univ.of Texas at Austin )

掲載資料名:

Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3333

発行年:

1998

巻:

Part 1

開始ページ:

747

終了ページ:

757

出版情報:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427786 [0819427780]

言語:

英語

請求記号:

P63600/3333

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018317
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	1998 : 15th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1998.02.23-1998.02.25

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4 国際会議録 Deprotection kinetics of alicyclic polymer resist systems designed for ArF(193nm) lithography Okoroanyanwu, Uzodinma, Byers, Jeffrey D., Cao, Ti, Webber, Stephen E., Willson, C. Grant American Chemical Society	10 国際会議録 Calibration of chemically amplified resist models Byers,J.D., Petersen,J.S., Sturtevant,J.L. SPIE-The International Society for Optical Engineering
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