Feasibility of a CVD-resist-based lithography process at 193-nm wavelength

Feasibility of a CVD-resist-based lithography process at 193-nm wavelength

著者名:

Lee,C.Y. ( Intel Corp. )

Das,S. ( Intel Corp. )

Yang,J. ( Intel Corp. )

Weidman,T.W. ( Applied Materials )

Sugiarto,D. ( Applied Materials )

Nault,M. ( Applied Materials )

Mui,D. ( Applied Materials )

Osborne,Z.A. ( Applied Materials )

さらに 3 件

掲載資料名:

Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3333

発行年:

1998

巻:

Part 1

開始ページ:

625

終了ページ:

633

出版情報:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427786 [0819427780]

言語:

英語

請求記号:

P63600/3333

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018317
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	1998 : 15th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1998.02.23-1998.02.25

類似資料:

1 国際会議録 Progress of a CVD-based photoresist 193-nm lithography process Lee, C. Y., Sugiarto, D., Liao, L., Mui, D., Weidman, T. W., Nault, M. P., Tryba, T. SPIE - The International Society of Optical Engineering	7 国際会議録 Application of scatterometry for CD and profile metrology in 193-nm lithography process development Chen, L.-J., Ke, C.-M., Yu, S.S., Gau, T.-S., Chen, P., Ku, Y.-C., Lin, B.J., Engelhard, D., Hetzer, D., Yang, J.Y., … SPIE-The International Society for Optical Engineering
2 国際会議録 Process optimization of a negative-tone CVD photoresist for 193-nm lithography applications Joubert, O. P., Fuard, D., Monget, C., Schiavone, P., Toublan, O., Prola, A., Temerson, J. M., Inglebert, R. L., … SPIE - The International Society of Optical Engineering	8 国際会議録 Resist component leaching in 193-nm immersion lithography Chapon, J.-D., Chaton, C., Gouraud, P., Broekaart, M., Warrick, S., Guilmeau, I., Trauiller, Y., Belledent, J. SPIE - The International Society of Optical Engineering
3 国際会議録 All Dry CVD-Based Resist for Advanced Lithography Processes Monget, C., Joubert, O., Vallier, L., Weidman, T.W. Electrochemical Society	9 国際会議録 Novel single-layer chemically amplified resist for 193-nm lithography Choi,S.-J., Kang,Y., Jung,D.-W., Park,C.-G., Moon,J.-T. SPIE-The International Society for Optical Engineering
4 国際会議録 Application of plasma-polymerized methylsilane for 0.18-ｦﾌm photolithography Monget,C., Lee,C.Y., Joubert,O.P., Amblard,G.R., Weidman,T.W., Sugiarto,D., Yang,J., Cormont,F., Inglebert,R.L. SPIE-The International Society for Optical Engineering	10 国際会議録 CVD photoresist performance for 248-nm lithography Monget, C., Joubert, O. P., Weidman, T. W., Toublan, O., Panabiere, J. -P., Weill, A. P. SPIE - The International Society of Optical Engineering
5 国際会議録 25 nm immersion lithography at 193 nm wavelength Choi, S.-H., Park, T.-H., Kim, E., Youn, H.-J., Lee, D.-Y., Ban, Y.-C., Je, A.-Y., Kim, D.-H., Hong, J.-S., Kim, Y.-H., … SPIE - The International Society of Optical Engineering	11 国際会議録 Synthesis of fluorinated materials for 193-nm immersion lithography and 157-nm lithography Lee, C. H., Han, S., Park, K. S., Kang, H. Y., Oh, H. W., Lee, J. E., Kim, K. M., Kim, Y. H., Kim, T. S., Oh, H.-K. SPIE - The International Society of Optical Engineering
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